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Optical, mechanical and electro-optical design of an interferometric test station for massive parallel inspection of MEMS and MOEMS

Haugholt, Karl Henrik
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SINTEF+S12973.pdf (3.714Mb)
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http://hdl.handle.net/11250/2430491
Utgivelsesdato
2009
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Originalversjon
Optical Measurement Systems for Industrial Inspection VI  
Sammendrag
The paper presents the optical, mechanical, and electro-optical design of an interferometric inspection system for massive parallel inspection of MicroElectroMechanicalSystems (MEMS) and MicroOptoElectroMechanicalSystems (MOEMS). The basic idea is to adapt a micro-optical probing wafer to the M(O)EMS wafer under test. The probing wafer is exchangeable and contains a micro-optical interferometer array. A low coherent and a laser interferometer array are developed. Two preliminary interferometer designs are presented; a low coherent interferometer array based on a Mirau configuration and a laser interferometer array based on a Twyman-Green configuration. The optical design focuses on the illumination and imaging concept for the interferometer array. The mechanical design concentrates on the scanning system and the integration in a standard test station for micro-fabrication. Models of single channel low coherence and laser interferometers and preliminary measurement results are presented. The smart-pixel approach for massive parallel electro-optical detection and data reduction is discussed.
 
Optical, mechanical and electro-optical design of an interferometric test station for massive parallel inspection of MEMS and MOEMS
 

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