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dc.contributor.authorKarsai, Ferenc
dc.contributor.authorEngel, Manuel
dc.contributor.authorKresse, Georg
dc.contributor.authorFlage-Larsen, Espen
dc.date.accessioned2020-12-23T12:08:07Z
dc.date.available2020-12-23T12:08:07Z
dc.date.created2019-03-07T09:57:45Z
dc.date.issued2018
dc.identifier.citationNew Journal of Physics. 2018, 20 (12), 1-13.en_US
dc.identifier.issn1367-2630
dc.identifier.urihttps://hdl.handle.net/11250/2720946
dc.description.abstractThe magnitude of the renormalization of the band gaps due to zero-point motions of the lattice is calculated for 18 semiconductors, including diamond and silicon. This particular collection of semiconductors constitute a wide range of band gaps and atomic masses. The renormalized electronic structures are obtained using stochastic methods to sample the displacement related to the vibrations in the lattice. Specifically, a recently developed one-shot method is utilized where only a single calculation is needed to get similar results as the one obtained by standard Monte-Carlo sampling. In addition, a fast real-space GW method is employed and the effects of G0W0 corrections on the renormalization are also investigated. We find that the band-gap renormalizations inversely depend on the mass of the constituting ions, and that for the majority of investigated compounds the G0W0 corrections to the renormalization are very small and thus not significant.en_US
dc.language.isoengen_US
dc.publisherIOP Scienceen_US
dc.rightsNavngivelse 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/deed.no*
dc.subjectband gap renormalizationen_US
dc.subjectdensity-functional theoryen_US
dc.subjectGW approximationen_US
dc.subjectelectron–phonon interactionen_US
dc.titleElectron-phonon coupling in semiconductors within the GW approximationen_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.description.versionpublishedVersionen_US
dc.rights.holderCopyright: The Authors. Original content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.en_US
dc.source.pagenumber1-13en_US
dc.source.volume20en_US
dc.source.journalNew Journal of Physicsen_US
dc.source.issue12en_US
dc.identifier.doi10.1088/1367-2630/aaf53f
dc.identifier.cristin1682813
dc.source.articlenumber123008en_US
cristin.unitcode7401,80,64,0
cristin.unitnameMaterialer og nanoteknologi
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1


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