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dc.contributor.authorHaugholt, Karl Henrik
dc.date.accessioned2017-02-09T14:04:10Z
dc.date.available2017-02-09T14:04:10Z
dc.date.created2015-09-24T20:06:03Z
dc.date.issued2009
dc.identifier.citationPhotonics Letters of Poland. 2009, 1 (2), 58-60.nb_NO
dc.identifier.issn2080-2242
dc.identifier.urihttp://hdl.handle.net/11250/2430158
dc.description.abstractThe paper presents the optical, mechanical, and electro-optical design of an interferometric inspection system for massive parallel inspection of Micro(Opto)ElectroMechanicalSystems (M(O)EMS). The basic idea is to adapt a micro-optical probing wafer to the M(O)EMS wafer under test. The probing wafer is exchangeable and contains a micro-optical interferometer array. Two preliminary interferometer designs are presented: a low coherent interferometer array based on the Mirau configuration and a laser interferometer array based on the Twyman-Green configuration. The optical design focuses on the illumination and imaging concept for the interferometer array. The mechanical design concentrates on a scanning system and integration in a standard test station for micro-fabrication. The smart-pixel approach for massive parallel electro-optical detection and data reduction is discussed.  
dc.description.abstractAn interferometric test station for massive parallel inspection of MEMS and MOEMS
dc.language.isoengnb_NO
dc.titleAn interferometric test station for massive parallel inspection of MEMS and MOEMSnb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.source.pagenumber58-60nb_NO
dc.source.volume1nb_NO
dc.source.journalPhotonics Letters of Polandnb_NO
dc.source.issue2nb_NO
dc.identifier.cristin1271794
cristin.unitcode7401,90,41,0
cristin.unitnameOptiske målesystemer og dataanalyse
cristin.ispublishedtrue
cristin.fulltextpostprint
cristin.qualitycode1


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