Blar i SINTEF Digital på tidsskrift "Nanomaterials"
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Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography
(Peer reviewed; Journal article, 2021)This study presents the design and manufacture of metasurface lenses optimized for focusing light with 1.55 µm wavelength. The lenses are fabricated on silicon substrates using electron beam lithography, ultraviolet-nanoimprint ... -
UV-Nanoimprint and Deep Reactive Ion Etching of High Efficiency Silicon Metalenses: High Throughput at Low Cost with Excellent Resolution and Repeatability
(Peer reviewed; Journal article, 2023)As metasurfaces begin to find industrial applications there is a need to develop scalable and cost-effective fabrication techniques which offer sub-100 nm resolution while providing high throughput and large area patterning. ... -
UV-Nanoimprint Lithography for Predefined SERS Nanopatterns Which Are Reproducible at Low Cost and High Throughput
(Peer reviewed; Journal article, 2023)A controlled and reliable nanostructured metallic substrate is a prerequisite for developing effective surface-enhanced Raman scattering (SERS) spectroscopy techniques. In this study, we present a novel SERS platform ...