| dc.contributor.author | Aarhaug, Thor Anders | |
| dc.date.accessioned | 2020-11-04T10:00:41Z | |
| dc.date.available | 2020-11-04T10:00:41Z | |
| dc.date.created | 2020-10-27T11:59:25Z | |
| dc.date.issued | 2020 | |
| dc.identifier.citation | Light Metals 2020 | en_US |
| dc.identifier.issn | 2367-1181 | |
| dc.identifier.uri | https://hdl.handle.net/11250/2686316 | |
| dc.description | The final publication is available at https://link.springer.com/chapter/10.1007%2F978-3-030-36408-3_100 | en_US |
| dc.description.abstract | Quantum cascade lasers (QCL) has open the mid-infrared (mid-IR) spectral range for laser gas monitors. For perfluorocarbon gases (PFCs) such as CF4, continuous emission monitors are now commercially available. Since these instruments can only make use of a narrow IR band, spectral interference from other gas species is not easily resolved. In this paper a commercial QCL CF4 analyser is validated with respect to sensitivity and selectivity. In the laboratory, the laser was mounted on a 0.3-m measurement cell. A gas mixer provided humidified gas mixtures of CF4 and methane. The results indicated that while there was no interference from water in the range up to 8000 ppm H2O, a small interference from methane was observed. This was quantified to be approximately 3 ppb CF4 per ppm of methane. The sensitivity of the instrument was found to be 10.5 ppb CF4 for one-meter light path. | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Springer | en_US |
| dc.relation.ispartofseries | The Minerals, Metals & Materials Series;2367-1181 | |
| dc.subject | Quantum cascade laser | en_US |
| dc.subject | Emission monitoring | en_US |
| dc.subject | Perfluorocarbon | en_US |
| dc.subject | PFC | en_US |
| dc.title | Validation of QCL CF4 Gas Analyzer for Sensitivity and Selectivity | en_US |
| dc.type | Peer reviewed | en_US |
| dc.type | Journal article | en_US |
| dc.description.version | acceptedVersion | en_US |
| dc.rights.holder | © The Minerals, Metals & Materials Society 2020 | en_US |
| dc.source.pagenumber | 744-750 | en_US |
| dc.identifier.doi | 10.1007/978-3-030-36408-3_100 | |
| dc.identifier.cristin | 1842564 | |
| cristin.ispublished | true | |
| cristin.fulltext | postprint | |
| cristin.qualitycode | 1 | |
