Browsing SINTEF Open by Author "Ordnung, Daniel Alfred"
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Towards high-throughput large-area metalens fabrication using UV-nanoimprint lithography and Bosch deep reactive ion etching
Dirdal, Christopher Andrew; Jensen, Geir Uri; Angelskår, Hallvard; Thrane, Paul Conrad Vaagen; Gjessing, Jo; Ordnung, Daniel Alfred (Peer reviewed; Journal article, 2020)We demonstrate the fabrication of diffraction-limited dielectric metasurface lenses for NIR by the use of standard industrial high-throughput silicon processing techniques: UV nano imprint lithography (UV-NIL) combined ...