Browsing SINTEF Open by Author "Angelskår, Hallvard"

Now showing items 1-5 of 5

    • Metasurface Fabrication by Cryogenic and Bosch Deep Reactive Ion Etching 

      Baracu, Angela; Dirdal, Christopher Andrew; Avram, Andrei; Dinescu, Adrian; Muller, Raluca; Jensen, Geir Uri; Thrane, Paul Conrad Vaagen; Angelskår, Hallvard (Peer reviewed; Journal article, 2021)
      The research field of metasurfaces has attracted considerable attention in recent years due to its high potential to achieve flat, ultrathin optical devices of high performance. Metasurfaces, consisting of artificial ...

    • Study of waveguide background at visible wavelengths for on-chip nanoscopy 

      Coucheron, David Andre; HELLE, OYSTEIN I.; Wilkinson, James S.; MURUGAN, GANAPATHY SENTHIL; DOMINGUEZ, CARLOS; Angelskår, Hallvard; AHLUWALIA, BALPREET S. (Peer reviewed; Journal article, 2021)
      On-chip super-resolution optical microscopy is an emerging field relying on waveguide excitation with visible light. Here, we investigate two commonly used high-refractive index waveguide platforms, tantalum pentoxide ...

    • Studying light-induced degradation by lifetime decay analysis: Excellent fit to solution of simple second-order rate equation 

      Nærland, Tine Uberg; Haug, Halvard; Angelskår, Hallvard; Søndenå, Rune; Marstein, Erik Stensrud; Arnberg, Lars (Journal article; Peer reviewed, 2013)
      Twenty different boron-doped Czochralski silicon materials have been analyzed for light-induced degradation. The carrier lifetime degradation was monitored by an automated quasi-steady-state photoconductance setup with an ...

    • Towards high-throughput large-area metalens fabrication using UV-nanoimprint lithography and Bosch deep reactive ion etching 

      Dirdal, Christopher Andrew; Jensen, Geir Uri; Angelskår, Hallvard; Thrane, Paul Conrad Vaagen; Gjessing, Jo; Ordnung, Daniel Alfred (Peer reviewed; Journal article, 2020)
      We demonstrate the fabrication of diffraction-limited dielectric metasurface lenses for NIR by the use of standard industrial high-throughput silicon processing techniques: UV nano imprint lithography (UV-NIL) combined ...

    • Wood's anomalies and spectral uniformity of focusing diffractive optical elements 

      Angelskår, Hallvard; Johansen, Ib-Rune; Lacolle, Matthieu Jean P; Sudbø, Aasmund Sveinung (Journal article, 2010)
      We report on simulations and measurements of focusing diffractive optical elements, fabricated as two-level binary optics. The diffractive optical elements are designed to separate and focus four specific wavelengths in ...